Developments in Surface Contamination and Cleaning Vol 1

Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 0323312705
Format: PDF, ePub, Docs
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Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field

Developments in Surface Contamination and Cleaning Volume 7

Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 0323311458
Format: PDF, Kindle
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As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects

Developments in Surface Contamination and Cleaning

Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 143777881X
Format: PDF, Mobi
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In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Feature: Comprehensive coverage of innovations in surface contamination and cleaning Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning problem, saving the time involved in consulting a range of disparate sources. Feature: Written by established experts in the contamination and cleaning field Benefit: Provides an authoritative resource Feature: Each chapter is a comprehensive review of the state of the art. Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute innovations. Feature: Case studies included Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning and contamination problems.

Developments in Surface Contamination and Cleaning Volume 4

Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 1437778844
Format: PDF, Mobi
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In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Comprehensive coverage of innovations in surface contamination and cleaning Written by established experts in the contamination and cleaning field Each chapter is a comprehensive review of the state of the art Case studies included

Developments in Surface Contamination and Cleaning Vol 2

Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 9781437778304
Format: PDF, Mobi
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Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. · Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination · Covers contamination and cleaning issues at the nanoscale · Includes an in-depth look at ultrasonic cleaning

Developments in Surface Contamination and Cleaning Volume 8

Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 0323312713
Format: PDF, ePub, Docs
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As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Covers novel wet and dry surface cleaning methods of increasing commercial importance

Developments in Surface Contamination and Cleaning Applications of Cleaning Techniques

Author: Rajiv Kohli
Publisher: Elsevier
ISBN: 0128155787
Format: PDF, ePub
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Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries Serves as a guide to the selection of precision cleaning techniques for specific applications

Analytische Transmissionselektronenmikroskopie

Author: Jürgen Thomas
Publisher: Springer-Verlag
ISBN: 3709114403
Format: PDF, ePub
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Die Autoren des Buches fassen ihre im Zuge vielseitiger Lehrtätigkeit gesammelten Erfahrungen zu häufig gestellten Fragen und Problemen von Anfängern im Umgang mit dem analytischen Transmissionselektronenmikroskop anschaulich zusammen. Dabei bilden Erklärungen anhand einfacher Modellvorstellungen und Hinweise zur praktischen Umsetzung des Erlernten die Schwerpunkte des Buches. Dieses praxisnahe Lehrbuch bietet somit eine klare und verständliche Einführung für all jene, die für Ihre Arbeit das Transmissionselektronenmikroskop verwenden wollen, jedoch noch nicht speziell dafür ausgebildet sind.

Lebenslinien

Author: Wilhelm Ostwald
Publisher: BoD – Books on Demand
ISBN: 384302233X
Format: PDF, ePub, Mobi
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Wilhelm Ostwald: Lebenslinien. Eine Selbstbiographie Erstdruck: Berlin (Klasing) 1926/1927. Vollständige Neuausgabe. Herausgegeben von Karl-Maria Guth. Berlin 2013. Textgrundlage ist die Ausgabe: Ostwald, Wilhelm: Lebenslinien. Eine Selbstbiographie, 3 Teile, Berlin: Klasing, 1926/1927. Die Paginierung obiger Ausgabe wird in dieser Neuausgabe als Marginalie zeilengenau mitgeführt. Umschlaggestaltung von Thomas Schultz-Overhage unter Verwendung des Bildes: Wilhelm Ostwald (1903). Gesetzt aus Minion Pro, 11 pt. Über den Autor: Neben dessen Gründer Ernst Haeckel war der Freimaurer und Chemie-Nobelpreisträger Wilhelm Ostwald einer der führenden Köpfe des Deutschen Monistenbundes, der eine wissenschaftlich begründbare Weltanschauung nach dem Prinzip der Einheit von Natur und Geist vertrat und dabei christlicher Dogmatik widersprach. Er schlug unter dem Namen »Weltdeutsch« ein vereinfachtes Deutsch als internationale Plansprache vor und setzte sich für ein Weltgeld ein. Nach Differenzen mit der Universität Leipzig legte er seinen Lehrstuhl nieder und lebte als Privatforscher bis zu seinem Lebensende 1932 auf seinem Landsitz in Großbothen.