Handbook of Advanced Plasma Processing Techniques

Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Format: PDF, Docs
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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

MEMS Materials and Processes Handbook

Author: Reza Ghodssi
Publisher: Springer Science & Business Media
ISBN: 9780387473185
Format: PDF, Mobi
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MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.

Handbook of Silicon Wafer Cleaning Technology

Author: Karen A. Reinhardt
Publisher: Noyes Publications
ISBN: 9780815515548
Format: PDF, Docs
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Now updated, this handbook addresses wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. It discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, and residue from wafer surfaces.

Handbook of Advanced Ceramics

Author: Shigeyuki Somiya
Publisher: Academic Press
ISBN: 0080532942
Format: PDF, ePub
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A two-volume reference set for all ceramicists, both in research and working in industry The only definitive reference covering the entire field of advanced ceramics from fundamental science and processing to application Contributions from over 50 leading researchers from around the world This new Handbook will be an essential resource for ceramicists. It includes contributions from leading researchers around the world, and includes sections on: Basic Science of Advanced Ceramic, Functional Ceramics (electro-ceramics and optoelectro-ceramics) and engineering ceramics. Contributions from over 50 leading researchers from around the world

Semiconductor Manufacturing Handbook

Author: Hwaiyu Geng
Publisher: McGraw-Hill Education
ISBN: 9781259587696
Format: PDF, ePub
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Fully updated, state-of-the-art semiconductor design and manufacturing information This fully updated handbook provides cutting-edge technologies and state-of-the-art processes needed to design and fabricate IC chips, MEMS, sensors, and other electronic devices. The book lays out the electronics fundamentals and techniques that are required to understand and accelerate the pace of innovation. Semiconductor Manufacturing Handbook, Second Edition consolidates many complex engineering and manufacturing disciplines into one volume, enabling the quick look up of specific reference data. Readers will get complete details on semiconductor fundamentals and basic materials, front-end of line processes, back-end of line processes, nanotechnology, MEMS, photovoltaics, gases and chemicals, and fab yield, operations and facilities. Covers the breadth and width of emerging technologies and manufacturing processes that enable big data, the Internet of Things, and smart manufacturing Fully explains global regulations and environmental requirements Written by 50 international experts and reviewed by a seasoned advisory board

Handbook for Cleaning for Semiconductor Manufacturing

Author: Karen A. Reinhardt
Publisher: John Wiley & Sons
ISBN: 9781118099513
Format: PDF, Docs
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This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews... "This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." —Randy Wallace, Department Head, Discovery Park Library, University of North Texas

Biomimetic Architectures by Plasma Processing

Author: Surojit Chattopadhyay
Publisher: CRC Press
ISBN: 9814463949
Format: PDF, ePub
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Plasma-processed biomimetic structures are an extremely focused and small subset of biomimetics. Although other methods can also be adopted, experimental synthesis of biomimetic structures mainly focuses on plasma processing. This book deals with the theoretical description of photonic structures available in nature, and the physics and applications of biomimetic structures prepared in the laboratory. It discusses anti-reflection properties of moth eye- or cicada wing-type nanostructured materials on semiconductor surfaces, with emphasis on plasma fabrication procedures. It also explains, with the help of related theories, the superhydrophobic or hydrophilic wetting properties demonstrated by most of these natural structures. It discusses biomedical applications, especially in implants, as one of the key applications of such materials. The book focuses mainly on plasma processing of biomimetic nanostructures and is, therefore, different from similar books that are more general in nature. It presents essential schematics, sufficient details, and advanced instrumentation techniques that would help readers understand why these structures are considered so important in materials science and physics.

Handbook of Liquids Assisted Laser Processing

Author: Arvi Kruusing
Publisher: Elsevier
ISBN: 9780080555041
Format: PDF, Docs
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Laser processing of solid materials has been commonly performed in gas ambient. Having the workpiece immersed into liquid, having a liquid film on it, or soaking the material with liquid gives several advantages such as removal of the debris, lowering the heat load on the workpiece, and confining the vapour and plasma, resulting in higher shock pressure on the surface. Introduced in the 1980s, neutral liquids assisted laser processing (LALP) has proved to be advantageous in the cutting of heat-sensitive materials, shock peening of machine parts, cleaning of surfaces, fabrication of micro-optical components, and for generation of nanoparticles in liquids. The liquids used range from water through organic solvents to cryoliquids. The primary aim of Handbook of Liquids-Assisted Laser Processing is to present the essentials of previous research (tabulated data of experimental conditions and results), and help researchers develop new processing and diagnostics techniques (presenting data of liquids and a review of physical phenomena associated with LALP). Engineers can use the research results and technological innovation information to plan their materials processing tasks. Laser processing in liquids has been applied to a number of different tasks in various fields such as mechanical engineering, microengineering, chemistry, optics, and bioscience. A comprehensive glossary with definitions of the terms and explanations has been added. The book covers the use of chemically inert liquids under normal conditions. Laser chemical processing examples are presented for comparison only. First book in this rapidly growing field impacting mechanical and micro/nano-engineering Covers different kinds of liquid-assisted laser processing of a large variety of materials Covers lasers emitting from UV to IR with pulse lengths down to femtoseconds Reviews over 500 scientific articles and 300 inventions and tabulates their main features Gives a qualitative and quantitative description of the physical phenomena associated with LALP Tabulates 61 parameters for 100 liquids Glossary of over 200 terms and abbreviations

Handbook of Refractory Carbides Nitrides

Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 081551770X
Format: PDF, ePub, Docs
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Refractory carbides and nitrides are useful materials with numerous industrial applications and a promising future, in addition to being materials of great interest to the scientific community. Although most of their applications are recent, the refractory carbides and nitrides have been known for over one hundred years. The industrial importance of the refractory carbides and nitrides is growing rapidly, not only in the traditional and well-established applications based on the strength and refractory nature of these materials such as cutting tools and abrasives, but also in new and promising fields such as electronics and optoelectronics.