Handbook of Advanced Plasma Processing Techniques

Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Format: PDF, ePub, Docs
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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

III V Integrated Circuit Fabrication Technology

Author: Shiban Tiku
Publisher: CRC Press
ISBN: 9814669318
Format: PDF, Docs
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GaAs processing has reached a mature stage. New semiconductor compounds are emerging that will dominate future materials and device research, although the processing techniques used for GaAs will still remain relevant. This book covers all aspects of the current state of the art of III–V processing, with emphasis on HBTs. It is aimed at practicing engineers and graduate students and engineers new to the field of III–V semiconductor IC processing. The book’s primary purpose is to discuss all aspects of processing of active and passive devices, from crystal growth to backside processing, including lithography, etching, and film deposition.

Handbook for Cleaning for Semiconductor Manufacturing

Author: Karen A. Reinhardt
Publisher: John Wiley & Sons
ISBN: 9781118099513
Format: PDF, ePub, Mobi
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This comprehensive volume provides an in-depth discussion of thefundamentals of cleaning and surface conditioning of semiconductorapplications such as high-k/metal gate cleaning, copper/low-kcleaning, high dose implant stripping, and silicon and SiGepassivation. The theory and fundamental physics associated with wetetching and wet cleaning is reviewed, plus the surface andcolloidal aspects of wet processing. Formulation developmentpractices and methodology are presented along with the applicationsfor preventing copper corrosion, cleaning aluminum lines, and othersensitive layers. This is a must-have reference for any engineer ormanager associated with using or supplying cleaning andcontamination free technologies for semiconductor manufacturing. From the Reviews... "This handbook will be a valuable resource for many academiclibraries. Many engineering librarians who work with a variety ofprograms (including, but not limited to Materials Engineering)should include this work in their collection. My recommendation isto add this work to any collection that serves a campus with amaterials/manufacturing/electrical/computer engineering programsand campuses with departments of physics and/or chemistry withlarge graduate-level enrollment." —Randy Wallace, Department Head, Discovery ParkLibrary, University of North Texas

Gallium Oxide

Author: Stephen Pearton
Publisher: Elsevier
ISBN: 0128145226
Format: PDF, Mobi
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Gallium Oxide: Technology, Devices and Applications discusses the wide bandgap semiconductor and its promising applications in power electronics, solar blind UV detectors, and in extreme environment electronics. It also covers the fundamental science of gallium oxide, providing an in-depth look at the most relevant properties of this materials system. High quality bulk Ga2O3 is now commercially available from several sources and n-type epi structures are also coming onto the market. As researchers are focused on creating new complex structures, the book addresses the latest processing and synthesis methods. Chapters are designed to give readers a complete picture of the Ga2O3 field and the area of devices based on Ga2O3, from their theoretical simulation, to fabrication and application. Provides an overview of the advantages of the gallium oxide materials system, the advances in in bulk and epitaxial crystal growth, device design and processing Reviews the most relevant applications, including photodetectors, FETs, FINFETs, MOSFETs, sensors, catalytic applications, and more Addresses materials properties, including structural, mechanical, electrical, optical, surface and contact

Microoptics and Nanooptics Fabrication

Author: Shanalyn Kemme
Publisher: CRC Press
ISBN: 9781420019148
Format: PDF, Mobi
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The deep interconnection between micro/nanooptical components and related fabrication technologies—and the constant changes in this ever-evolving field—means that successful design depends on the engineer’s ability to accommodate cutting-edge theoretical developments in fabrication techniques and experimental realization. Documenting the state of the art in fabrication processes, Microoptics and Nanooptics Fabrication provides an up-to-date synopsis of recent breakthroughs in micro- and nanooptics that improve key developmental processes. This text elucidates the precise and miniaturized scale of today’s fabrication methods and their importance in creating new optical components to access the spectrum of physical optics. It details successful fabrication techniques and their direct effect on the intended performance of micro- and nanooptical components. The contributors explore the constraints related to material selection, component lateral extent, minimum feature size, and other issues that cause fabrication techniques to lag behind corresponding theory in the development process. Written with the professional optical engineer in mind, this book omits the already well-published broader processing fundamentals. Instead it focuses on key tricks of the trade helpful in reformulating processes to achieve necessary optical targets, improve process fidelity, and reduce production costs. The contributing authors represent the vanguard in micro-optical fabrication. The result of their combined efforts, this searing analysis of emerging fabrication technologies will continue to fuel the expansion of optics components, from the microwave to the infrared through the visible regime.

Semiconductor Manufacturing Handbook

Author: Hwaiyu Geng
Publisher: McGraw Hill Professional
ISBN: 0071469656
Format: PDF, ePub, Mobi
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This handbook will provide engineers with the principles, applications, and solutions needed to design and manage semiconductor manufacturing operations. Consolidating the many complex fields of semiconductor fundamentals and manufacturing into one volume by deploying a team of world class specialists, it allows the quick look up of specific manufacturing reference data across many subdisciplines.

Handbook of Silicon Wafer Cleaning Technology 2nd Edition

Author: Karen Reinhardt
Publisher: William Andrew
ISBN: 0815517734
Format: PDF, Kindle
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The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol

Device and Process Technologies for MEMS and Microelectronics

Author: Jung-Chih Chiao
Publisher: Society of Photo Optical
ISBN: 9780819460684
Format: PDF
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Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.