Handbook of Advanced Plasma Processing Techniques

Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Format: PDF, Kindle
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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

MEMS Materials and Processes Handbook

Author: Reza Ghodssi
Publisher: Springer Science & Business Media
ISBN: 9780387473185
Format: PDF, ePub, Docs
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MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.

Handbook of Silicon Wafer Cleaning Technology

Author: Karen Reinhardt
Publisher: William Andrew
ISBN: 032351085X
Format: PDF, ePub, Mobi
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Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process

Plasma Technology for Hyperfunctional Surfaces

Author: Hubert Rauscher
Publisher: John Wiley & Sons
ISBN: 9783527630462
Format: PDF, Mobi
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Based on a project backed by the European Union, this is a must-have resource for researchers in industry and academia concerned with application-oriented plasma technology research. Clearly divided in three sections, the first part is dedicated to the fundamentals of plasma and offers information about scientific and theoretical plasma topics, plasma production, surface treatment process and characterization. The second section focuses on technological aspects and plasma process applications in textile, food packaging and biomedical sectors, while the final part is devoted to concerns about the environmental sustainability of plasma processes.

III V Integrated Circuit Fabrication Technology

Author: Shiban Tiku
Publisher: CRC Press
ISBN: 9814669318
Format: PDF, Docs
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GaAs processing has reached a mature stage. New semiconductor compounds are emerging that will dominate future materials and device research, although the processing techniques used for GaAs will still remain relevant. This book covers all aspects of the current state of the art of III–V processing, with emphasis on HBTs. It is aimed at practicing engineers and graduate students and engineers new to the field of III–V semiconductor IC processing. The book’s primary purpose is to discuss all aspects of processing of active and passive devices, from crystal growth to backside processing, including lithography, etching, and film deposition.

Semiconductor Manufacturing Handbook Second Edition

Author: Hwaiyu Geng
Publisher: McGraw-Hill Education
ISBN: 9781259587696
Format: PDF, Docs
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Thoroughly Revised, State-of-the-Art Semiconductor Design, Manufacturing, and Operations Information Written by 70 international experts and reviewed by a seasoned technical advisory board, this fully updated resource clearly explains the cutting-edge processes used in the design and fabrication of IC chips, MEMS, sensors, and other electronic devices. Semiconductor Manufacturing Handbook, Second Edition, covers the emerging technologies that enable the Internet of Things, the Industrial Internet of Things, data analytics, artificial intelligence, augmented reality, and and smart manufacturing. You will get complete details on semiconductor fundamentals, front- and back-end processes, nanotechnology, photovoltaics, gases and chemicals, fab yield, and operations and facilities. •Nanotechnology and microsystems manufacturing •FinFET and nanoscale silicide formation •Physical design for high-performance, low-power 3D circuits •Epitaxi, anneals, RTP, and oxidation •Microlithography, etching, and ion implantations •Physical, chemical, electrochemical, and atomic layer vapor deposition •Chemical mechanical planarization •Atomic force metrology •Packaging, bonding, and interconnects •Flexible hybrid electronics •Flat-panel,flexible display electronics, and photovoltaics •Gas distribution systems •Ultrapure water and filtration •Process chemicals handling and abatement •Chemical and slurry handling systems •Yield management, CIM, and factory automation •Manufacturing execution systems •Advanced process control •Airborne molecular contamination •ESD controls in clean-room environments •Vacuum systems and RF plasma systems •IC manufacturing parts cleaning technology •Vibration and noise design •And much more

Handbook of Advanced Radioactive Waste Conditioning Technologies

Author: Michael I Ojovan
Publisher: Elsevier
ISBN: 085709095X
Format: PDF, Mobi
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Radioactive wastes are generated from a wide range of sources, including the power industry, and medical and scientific research institutions, presenting a range of challenges in dealing with a diverse set of radionuclides of varying concentrations. Conditioning technologies are essential for the encapsulation and immobilisation of these radioactive wastes, forming the initial engineered barrier required for their transportation, storage and disposal. The need to ensure the long term performance of radioactive waste forms is a key driver of the development of advanced conditioning technologies. The Handbook of advanced radioactive waste conditioning technologies provides a comprehensive and systematic reference on the various options available and under development for the treatment and immobilisation of radioactive wastes. The book opens with an introductory chapter on radioactive waste characterisation and selection of conditioning technologies. Part one reviews the main radioactive waste treatment processes and conditioning technologies, including volume reduction techniques such as compaction, incineration and plasma treatment, as well as encapsulation methods such as cementation, calcination and vitrification. This coverage is extended in part two, with in-depth reviews of the development of advanced materials for radioactive waste conditioning, including geopolymers, glass and ceramic matrices for nuclear waste immobilisation, and waste packages and containers for disposal. Finally, part three reviews the long-term performance assessment and knowledge management techniques applicable to both spent nuclear fuels and solid radioactive waste forms. With its distinguished international team of contributors, the Handbook of advanced radioactive waste conditioning technologies is a standard reference for all radioactive waste management professionals, radiochemists, academics and researchers involved in the development of the nuclear fuel cycle. Provides a comprehensive and systematic reference on the various options available and under development for the treatment and immobilisation of radioactive wastes Explores radioactive waste characterisation and selection of conditioning technologies including the development of advanced materials for radioactive waste conditioning Assesses the main radioactive waste treatment processes and conditioning technologies, including volume reduction techniques such as compaction

Handbook for Cleaning for Semiconductor Manufacturing

Author: Karen A. Reinhardt
Publisher: John Wiley & Sons
ISBN: 9781118099513
Format: PDF
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This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews... "This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." —Randy Wallace, Department Head, Discovery Park Library, University of North Texas

Handbook of Physical Vapor Deposition PVD Processing

Author: D. M. Mattox
Publisher: Cambridge University Press
ISBN: 9780080946580
Format: PDF, ePub, Mobi
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This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories,"" to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Nanoparticle Technology Handbook

Author: Makio Naito
Publisher: Elsevier
ISBN: 0444641114
Format: PDF, Kindle
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Nanoparticle Technology Handbook, Third Edition, is an updated and expanded authoritative reference providing both the theory behind nanoparticles and the practical applications of nanotechnology. This third edition features twenty new chapters, providing a reference much broader in scope than the previous edition. Over 140 experts in nanotechnology and/or particle technology contributed to this new edition. The book not only includes the theory behind nanoparticles, but also the practical applications of nanotechnology. It examines future possibilities and new innovations and contains important knowledge on nanoparticle characterization and the effect of nanoparticles on the environment and humans. Nanoparticle technology is a new and revolutionary technology, which is increasingly used in electronic devices and nanomaterials. It handles the preparation, processing, application and characterization of nanoparticles and has become the core of nanotechnology as an extension of conventional fine particle/powder technology. Nanoparticle technology plays an important role in the implementation of nanotechnology in many engineering and industrial fields, including electronic devices, advanced ceramics, new batteries, engineered catalysts, functional paint and ink, drug delivery system, biotechnology, etc., making use of the unique properties of nanoparticles, which are completely different from those of bulk materials. Introduces all aspects of nanoparticle technology, from the fundamentals to applications Cover basic information on preparation through to the characterization of nanoparticles in a systematic way Features information on nanostructures, which play an important role in practical applications Includes the effects of nanoparticles on human health and the environment Includes applications of nanoparticles in diverse fields, including applications in new areas, such as electronics cosmetics, etc. Offers up-to-date information given by specialists in each field