Handbook of Chemical Vapor Deposition

Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 1437744885
Format: PDF, Mobi
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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.

Handbook of Chemical Vapor Deposition CVD

Author: Hugh O. Pierson
Publisher: William Andrew Publishing
ISBN: 9780815513001
Format: PDF, Docs
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A comprehensive overview of the principles, technology and application of chemical vapor deposition (CVD), an extremely versatile process which can be used to manufacture coatings, powders, fibers and monolithic components. It presents a clear, objective, systematic assessment of CVD, including an e

Chemical vapor deposition for microelectronics

Author: Arthur Sherman
Publisher: William Andrew Publishing
ISBN:
Format: PDF, ePub, Mobi
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Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics and kinetics, as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Materials Processing

Author: Lorraine F. Francis
Publisher: Academic Press
ISBN: 0123851335
Format: PDF, Kindle
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Materials Processing teaches students the fundamental principles involved in the processing of engineering materials, specifically metals, ceramics and polymers, from starting or raw materials through to the final functional forms. Processing is frequently treated from a materials specific point of view with courses and books that cover only one type of engineering material. This new text covers processing using a unified approach that is based on the state of matter most central to the shaping of the material: melt, solid, powder, dispersion and solution, and vapor. With this approach, students learn processing fundamentals and appreciate the similarities and differences between the materials classes. Coverage of metal, ceramic and polymer processing in a single text provides a self-contained approach and consistent nomenclature that allow for easier comparisons between various materials and processes Emphasis on fundamental principles gives students a strong foundation for understanding processing and manufacturing methods Development of connections between processing and structure builds on students’ existing knowledge of structure - property relationships Examples of both standard and newer additive manufacturing methods throughout provide students with an overview of the methods that they will likely encounter in their careers

Handbuch W rmebehandeln und Beschichten

Author: Günter Spur
Publisher: Carl Hanser Verlag GmbH Co KG
ISBN: 3446430032
Format: PDF, Mobi
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Das Handbuch der Fertigungstechnik ist die 2., vollständig neu bearbeitete Auflage des im Zeitraum von 1979 bis 1994 im Carl Hanser Verlag erschienen mehrbändigen Werkes. Es ist ein in seiner Themenbreite und Tiefe bis heute unerreichtes Nachschlagewerk für die Ingenieure der Fertigungstechnik. In der Neuauflage wird diese Tradition fortgesetzt. Der Band Wärmebehandeln und Beschichten ist eine einzigartige Kombination von Fertigungsverfahren zur Einstellung und Optimierung des „Innen und Außen“ von metallischen Endprodukten. Er enthält die Verfahren wie Härten, Glühen, Chromieren, Nitrieren, Aufdampfen, Auftragen, Galvanisieren, Sputtern, Lackieren, Emaillieren, Polymerisieren, Plattieren, Walzen, Spritzen, Tauchen und viele mehr. In anwendungstechnischen Vergleichen werden die Vor- und Nachteile der Verfahren für unterschiedliche Beschichtungssysteme bzw. Legierungen gezeigt. Hinweise zur Kontrolle entscheidender Verfahrensparameter helfen dem Anwender bei der Prozessgestaltung und -verbesserung sowie bei der Überwachung und Minimierung von Umwelt- und Arbeitslatzbelastungen. Detaillierte Beschreibungen von Beschichtungsanlagen, Öfen und Verfahren zur Vorbehandlung, Nachbehandlung und Prüfung runden das Werk ab. Zur Edition Handbuch der Fertigungstechnik gehören außerdem: Handbuch Urformen Handbuch Umformen Handbuch Spanen Handbuch Fügen, Handhaben und Montieren

Chemical Vapour Deposition

Author: Xiu-Tian Yan
Publisher: Springer Science & Business Media
ISBN: 9781848828940
Format: PDF
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"Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.

Handbook of Industrial Refractories Technology

Author: Stephen Caniglia
Publisher: William Andrew
ISBN: 0815517564
Format: PDF, ePub, Mobi
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Encompasses the entire range of industrial refractory materials and forms: properties and their measurement, applications, manufacturing, installation and maintenance techniques, quality assurance, and statistical process control.

Handbook of Thin Film Deposition Processes and Techniques

Author: Krishna Seshan
Publisher: William Andrew
ISBN: 0815517785
Format: PDF
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New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Chemical Vapour Deposition

Author: Anthony C. Jones
Publisher: Royal Society of Chemistry
ISBN: 0854044655
Format: PDF, Mobi
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Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from these different research areas. The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few chapters. Then follows a detailed description of the use of a variety CVD techniques to deposit a wide range of materials, including semiconductors, metals, metal oxides and nitrides, protective coatings and functional coatings on glass. Finally and uniquely, for a technical volume, industrial and commercial aspects of CVD are also discussed together with possible future trends, which is an unusual, but very important aspect of the book. The book has been written with CVD practitioners in mind, such as the chemist who wishes to learn more about CVD processes, or the CVD technologist who wishes to gain an increased knowledge of precursor chemistry. The volume will prove particularly useful to those who have recently entered the field, and it will also make a valuable contribution to chemistry and materials science lecture courses at undergraduate and postgraduate level.

Materials and Processes for Surface and Interface Engineering

Author: Y. Pauleau
Publisher: Springer Science & Business Media
ISBN: 9401100772
Format: PDF
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Materials and Processes for Surface and Interface Engineering, which has been written by experts in the fields of deposition technology and surface modification techniques, offers up to date tutorial papers on the latest advances in surface and interface engineering. The emphasis is on fundamental aspects, principles and applications of plasma and ion beam processing technology. A handbook for the engineer and scientist as well as an introduction for students in several branches of materials science and surface engineering.