Introduction to Microelectronic Fabrication

Author: Richard C. Jaeger
Publisher:
ISBN: 9780201444940
Format: PDF, ePub, Docs
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This introductory book assumes minimal knowledge of the existence of integrated circuits and of the terminal behavior of electronic components such as resistors, diodes, and MOS and bipolar transistors. It presents to readers the basic information necessary for more advanced processing and design books. Focuses mainly on the basic processes used in fabrication, including lithography, oxidation, diffusion, ion implementation, and thin film deposition. Covers interconnection technology, packaging, and yield. Appropriate for readers interested in the area of fabrication of solid state devices and integrated circuits.

Semiconductor Optoelectronic Devices

Author: Joachim Piprek
Publisher: Elsevier
ISBN: 0080469787
Format: PDF
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Optoelectronics has become an important part of our lives. Wherever light is used to transmit information, tiny semiconductor devices are needed to transfer electrical current into optical signals and vice versa. Examples include light emitting diodes in radios and other appliances, photodetectors in elevator doors and digital cameras, and laser diodes that transmit phone calls through glass fibers. Such optoelectronic devices take advantage of sophisticated interactions between electrons and light. Nanometer scale semiconductor structures are often at the heart of modern optoelectronic devices. Their shrinking size and increasing complexity make computer simulation an important tool to design better devices that meet ever rising perfomance requirements. The current need to apply advanced design software in optoelectronics follows the trend observed in the 1980's with simulation software for silicon devices. Today, software for technology computer-aided design (TCAD) and electronic design automation (EDA) represents a fundamental part of the silicon industry. In optoelectronics, advanced commercial device software has emerged recently and it is expected to play an increasingly important role in the near future. This book will enable students, device engineers, and researchers to more effectively use advanced design software in optoelectronics. Provides fundamental knowledge in semiconductor physics and in electromagnetics, while helping to understand and use advanced device simulation software Demonstrates the combination of measurements and simulations in order to obtain realistic results and provides data on all required material parameters Gives deep insight into the physics of state-of-the-art devices and helps to design and analyze of modern optoelectronic devices

Fabrication Engineering at the Micro and Nanoscale

Author: Stephen A. Campbell
Publisher: Oxford University Press, USA
ISBN: 9780199861224
Format: PDF
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Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, Fabrication Engineering at the Micro- and Nanoscale, Fourth Edition, covers the entire basic unit processes used to fabricate integrated circuits and other devices. With many worked examples and detailed illustrations, this engaging introduction provides the tools needed to understand the frontiers of fabrication processes. NEW TO THIS EDITION Coverage of many new topics including: - the flash and spike annealing processes - extreme ultraviolet (EUV) lithography - GaN epitaxial growth and doping - double exposure routes to sub-35-nm lithography - architectures for nanoscale CMOS as practiced at the 45-nm node - trigate or FINFET CMOS planned for 22 nm and below - bulk silicon and thin film solar cell manufacturing - GaN LED fabrication - microfluidics Updated sections on nonoptical lithography Expanded content on state-of-the-art CMOS A Companion Website with PowerPoint slides of figures from the text (www.oup.com/us/campbell) An Instructor's Solutions Manual, available to registered adopters of the text (978-0-19-986121-7)

Linear State Space Control Systems

Author: Robert L. Williams, II
Publisher: John Wiley & Sons
ISBN: 0471735558
Format: PDF, ePub
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The book blends readability and accessibility common to undergraduate control systems texts with the mathematical rigor necessary to form a solid theoretical foundation. Appendices cover linear algebra and provide a Matlab overivew and files. The reviewers pointed out that this is an ambitious project but one that will pay off because of the lack of good up-to-date textbooks in the area.

The Science and Engineering of Microelectronic Fabrication

Author: Stephen A. Campbell
Publisher: Oxford University Press, USA
ISBN: 9780195136050
Format: PDF, Docs
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The Science and Engineering of Microelectronic Fabrication provides a thorough introduction to the field of microelectronic processing. Geared toward a wide audience, it may be used for upper-level undergraduate or first year graduate courses and as a handy reference for professionals. The text covers all the basic unit processes used to fabricate integrated circuits, including photolithography, plasma and reactive ion etching, ion implantation, diffusin, oxidation, evaporation, vapor phase epitaxial growth, sputtering, and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, non-optical lithography, molecular beam epitaxy, and metal organic chemica vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacturing of integrated circuits. The text also discusses the itnegration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of the current state-of-the-art devices. Each chapter includes sample problems with solutions. The text makes use of the process simulation package SUPREM to demonstrate impurity profiles of practical interest. The new edition includes complete chapter coverage of MEMS including: Fundamentals of Mechanics, Stress in Thin Films, Mechanical to Electrical Transduction, Mechanics of Common MEMS Devices, Bulk Micromachining Etching Techniques, Bulk Micromachining Process Flow, Surface Micromachining Basics, Surface Micromachining Process Flow, MEMS Actuators, High Aspect Ratio Microsystems Technology (HARMST).

Advanced Semiconductor Fundamentals

Author: Robert F. Pierret
Publisher:
ISBN: 9780130617927
Format: PDF, ePub, Mobi
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Focus on silicon-based semiconductors—a real-world, market-dominating issue that will appeal to people looking to apply what they are learning. Comprehensive coverage includes treatment of basic semiconductor properties, elements of Quantum Mechanics, energy band theory, equilibrium carrier statistics, recombination-generation processes, and drift/diffusion carrier transport. Practicing engineers and scientists will find this volume helpful, whether it be self-study, reference, or review.

The Bipolar Junction Transistor

Author: Gerold W. Neudeck
Publisher: Prentice Hall
ISBN:
Format: PDF, Mobi
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This book presents both a qualitative and quantitative description of the device. The second edition has been refined to improve pedagogical effectiveness.

Micromachined Transducers Sourcebook

Author: Gregory T. A. Kovacs
Publisher: McGraw-Hill Science, Engineering & Mathematics
ISBN: 9780072907223
Format: PDF, ePub, Mobi
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Designed for a graduate-level course in micromachined devices, or as an introduction to the field for practicing engineers, this book presents an overview of the field, beginning with micromachining approaches and including all major categories of transduction. It examines the fabrication of individual devices through the study of design issues and provides examples of key transducers, or structures, for comparison of performances obtainable through different approaches.

VLSI Fabrication Principles

Author: Sorab K. Ghandhi
Publisher: Wiley-Interscience
ISBN:
Format: PDF, Kindle
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Fully updated with the latest technologies, this edition covers the fundamental principles underlying fabrication processes for semiconductor devices along with integrated circuits made from silicon and gallium arsenide. Stresses fabrication criteria for such circuits as CMOS, bipolar, MOS, FET, etc. These diverse technologies are introduced separately and then consolidated into complete circuits. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.